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Analysis of Multi-Layer Thin Films by XRF

Published online by Cambridge University Press:  06 March 2019

M. Kaufmann ,
M. Mantler  and
F. Weber
M. Kaufmann
Affiliation:
Institute of Applied and Technical PhysicsUniversity of Technology, Vienna Wiedner Haupstraβe 8-10, A-1040 Vienna, Austria
M. Mantler
Affiliation:
Institute of Applied and Technical PhysicsUniversity of Technology, Vienna Wiedner Haupstraβe 8-10, A-1040 Vienna, Austria
F. Weber
Affiliation:
Institute of Applied and Technical PhysicsUniversity of Technology, Vienna Wiedner Haupstraβe 8-10, A-1040 Vienna, Austria
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Abstract

The characterization of multi-layer thin film properties, such as thicknesses of layers or concentrations of elements, using the fundamental parameter method is discussed. Experimental results are shown for repetitive multi-layers of up to 80 layers. Furthermore the impact of using different characteristic lines on the information depth and the resolving power is discussed for single layers and repetitive multi-layers. Finally, thin films containing light elements are presented; in this case the conventional fundamental parameter theory fails to provide accurate results, perhaps due to the neglect of the impact of the secondary excitation by photoelectrons.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 37: Forty-Second Annual Conference on Applications of X-ray Analysis, August 2-6, 1993 , 1993 , pp. 205 - 212
Copyright
Copyright © International Centre for Diffraction Data 1993

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References

1. Huang, T.C. and Parrish, W., Adv. in X-Ray Analysis, Vol. 29 (1986)Google Scholar
2. Mantler, M., Prog.Crystal and Charct., Vol. 14, pp. 213–261 (1987)Google Scholar
3. D.K.G., de Boer, X-Ray Spectrometry, Vol. 19, pp. 145–154(1990)Google Scholar
4. Mori, S. and Mantler, M., submitted to Adv. in X-Ray Analysis Google Scholar
5. Laguitton, D. and Mantler, M., Anal. Chem., pp. 20-515 (1977)Google Scholar
6. Huang, T.C., X-Ray Spectrom., Vol. 10, pp. 10–28 (1981)Google Scholar
7. McMasters, W.H., DelGrande, N.K., Mallet, J. H. and Hubbell, J. H.: Rep. UCRL-50174, Sec.II (1969)Google Scholar
8. Henke, B.L. and Ebisu, E. S.: Advances in X-Ray Analysis, Vol. 17, pp. 150–213 (1974)Google Scholar
9. Bearden, J.A., Rev. Mod. Phys.yd. 39, pp. 78–142 (1967)Google Scholar
10. Bearden, J.A. and collaborators, X-Ray Wavelengths, NYO-10586, Natl.Tech, Inf. Service, Springfield, Va. (1964)Google Scholar
11. Fink, R.W. and Venugopala, P., in: Handbook of Spectroscopy, Robinson, J.W., ed., CRC Press, Boca Raton, Florida (1974)Google Scholar
12. Miller, D.C., IBM Almaden Research Center, San Jose, CA, private communication, 1993 Google Scholar
13. Weber, F., Mantler, M. and Kaufmann, M., submitted to Adv. in X-Ray Analysis Google Scholar