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Determination of Thickness and Composition of Thin AlxGa1-xAs Layers on GaAs by Total Electron Yield (TEY)

Published online by Cambridge University Press:  06 March 2019

Maria F. Ebel
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner Hauptstraβe 8-10
Robert Svagera
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner Hauptstraβe 8-10
Horst Ebel
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner Hauptstraβe 8-10
Robert Hobl
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner Hauptstraβe 8-10
Michael Mantler
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner Hauptstraβe 8-10
Johann Wernisch
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner Hauptstraβe 8-10
Norbert Zagler
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner Hauptstraβe 8-10
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Extract

The measurement of the total electron yield (TEY) emitted from a solid specimen when irradiated by monochromatic x-rays is used for quantitative information on the specimen. For this purpose one has to determine the increase of TEY in the course of a variation of the photon energy from below to above the absorption edges of the specimen elements. These increases are the analytical quantities and are correlated with the composition of the specimen. The detected electrons are photo, Auger and secondary electrons. Most of them lost some of their original kinetic energy due to inelastic collisions along their path from the atom of origin to the surface. Low energy electrons are especially found in the secondary electron peak with electron energies of less than 20eV. Electrically nonconductive specimens under x-irradiation tend to positive surface charging.

Type
III. Applications of Diffraction to Semiconductors and Films
Copyright
Copyright © International Centre for Diffraction Data 1994

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References

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