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Fluorescence Analysis of Trace Amounts of Hafnium in Zirconium Using a Silicon Crystal

Published online by Cambridge University Press:  06 March 2019

J.C. Parks Jr. ,
D.G. Plackmann  and
G. H. Beyer
J.C. Parks Jr.
Affiliation:
University of Missouri, Columbia, Missouri
D.G. Plackmann
Affiliation:
University of Missouri, Columbia, Missouri
G. H. Beyer
Affiliation:
University of Missouri, Columbia, Missouri
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Abstract

The proper choice of an analyzing crystal sometimes makes It possible to suppress second-order reflections which interfere with X-ray fluorescence analysis. Some of the problems associated with the analysis of small amounts of hafnium in zirconium, using a silicon crystal and a pulse-height analyzer, are discussed.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 4: Ninth Annual Conference on Applications of X-ray Analysis, August 10-12, 1960 , 1960 , pp. 488 - 494
Copyright
Copyright © International Centre for Diffraction Data 1960

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References

1. Lublin, P., “A NovelApproachtoDiscriminationinX-ray Spectrographic Analysis,” Advances in X-Ray Analysis, Vol. 2, University of Denver, Plenum Press, New York, 1960, pp. 229–237.Google Scholar
2. Miller, D. C., “Some Considerations in the Use of Pulse Height Analysis with X-rays,” Norelco Reporter, Vol. IV, No, 2.Google Scholar