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The Use of Energy Dispersive Diffractometry to Measure the Thickness of Metal and Glass Thin Films
Published online by Cambridge University Press: 06 March 2019
Extract
This paper presents a new method to measure the thickness of very thin films on a substrate material using energy dispersive x-ray diffractometry. The method can be used for many film-substrate combinations. The specific application to be presented is the measurement of phosphosilicate glass films on single crystal silicon wafers.
- Type
- VIII. XRD Applications
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- Copyright © International Centre for Diffraction Data 1981