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Nondestructive Characterization of Multilayer Thin Films by X-ray Reflectivity
Published online by Cambridge University Press: 06 March 2019
Abstract
The X-ray reflectivity technique was used to study the annealing effect on layer structure of Ta/FeMn/NiFe/Cu/NiFe/Ta multilayer thin films on Si substrates. High-resolution specular reflectivity data were collected and analyzed by least-squares refinement. Results on layer thickness, density and roughness were obtained and correlated with the magnetic properties of the films.
- Type
- III. Applications of Diffraction to Semiconductors and Films
- Information
- Advances in X-Ray Analysis , Volume 38: Forty-third Annual Conference on Applications of X-ray Analysis , 1994 , pp. 139 - 143
- Copyright
- Copyright © International Centre for Diffraction Data 1994