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A system for real-time in situ photoelectron spectroscopy

Published online by Cambridge University Press:  01 November 2010

D. P. Langstaff*
Affiliation:
IMAPS, Aberystwyth University, Aberystwyth, Wales SY23 3BZ, UK
O. R. Roberts
Affiliation:
IMAPS, Aberystwyth University, Aberystwyth, Wales SY23 3BZ, UK
G. T. Williams
Affiliation:
IMAPS, Aberystwyth University, Aberystwyth, Wales SY23 3BZ, UK
D. A. Evans
Affiliation:
IMAPS, Aberystwyth University, Aberystwyth, Wales SY23 3BZ, UK
*
Email address for correspondence:dpl@aber.ac.uk
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Abstract

A system is presented which combines photoelectron spectroscopy with complementary characterization techniques in order to provide in situ analysis of surfaces processes. The real-time capability of photoelectron spectroscopy has been enabled by an electron counting array detector that allows core and valence level spectra to be recorded in 1–10 s using a laboratory X-ray source and as low as 25 ms when coupled to synchrotron radiation source.

The efficient detection system is combined with a versatile heater stage, temperature and vacuum monitoring, and controllable evaporation sources in order to monitor chemical, structural and electronic changes in situ. The heated stage allows a range of programmed heating and cooling regimes to be applied to samples. Evaporation sources are provided for medium-temperature materials such as small organic molecules and high-temperature metals such as aluminium. The system has a linked vacuum vessel for plasma etching and Ar ion sputtering for surface preparation.

Type
Poster paper
Copyright
Copyright © Diamond Light Source Ltd 2010

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References

REFERENCES

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