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Addendum: “Partial agglomeration during Co silicide film formation” [J. Mater. Res. 7, 269 (1992)]
Published online by Cambridge University Press: 31 January 2011
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- Addendum
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- Copyright © Materials Research Society 1992
References
3Xiao, Z. G., Rozgonyi, G. A., Jiang, H., Honey-cutt, J., Osburn, C. M., and McGuire, G., in Extended Abstracts, Vol. 90–1 (1990) of the Electrochem. Soc, Pennington, NJ, p. 258.”Google Scholar