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Deposition of diamond onto aluminum by electron cyclotron resonance microwave plasma-assisted CVD

Published online by Cambridge University Press:  31 January 2011

C.R. Eddy Jr. ,
D.L. Youchison ,
B.D. Sartwell  and
K.S. Grabowski
C.R. Eddy Jr.
Affiliation:
Naval Research Laboratory, Code 4670, Washington, DC 20375-5000
D.L. Youchison
Affiliation:
Naval Research Laboratory, Code 4670, Washington, DC 20375-5000
B.D. Sartwell
Affiliation:
Naval Research Laboratory, Code 4670, Washington, DC 20375-5000
K.S. Grabowski
Affiliation:
Naval Research Laboratory, Code 4670, Washington, DC 20375-5000
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Abstract

Diamond crystallites and thin films have been deposited onto polycrystalline aluminum substrates utilizing an electron cyclotron resonance microwave plasma-assisted chemical vapor deposition (ECR-PACVD) method. For all depositions, the substrates were biased to +40 V dc with respect to ground and their temperature was maintained at 500 °C. Similar deposits were obtained from two different feedgas systems at a total pressure of 1.33 Pa (10 mTorr). The first system consisted of a carbon monoxide (CO) and hydrogen (H2) mixture (CO:H2 = 20:80), and the second was a methane (CH4), oxygen (O2), and hydrogen (H2) mixture (CH4:O2:H2 = 21:10:69). The deposits were subsequently characterized by scanning electron microscopy, micro-Raman spectroscopy, and x-ray diffraction. The results of these analyses indicate that polycrystalline diamond was deposited onto aluminum substrates, as both individual crystallites and continuous films.

Type
Articles
Information
Journal of Materials Research , Volume 7 , Issue 12 , December 1992 , pp. 3255 - 3259
Copyright
Copyright © Materials Research Society 1992

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References

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