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Evolution of multilayered scale structures during high temperature oxidation of ZrSi2

Published online by Cambridge University Press:  20 October 2016

Hwasung Yeom
Affiliation:
Department of Engineering Physics, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA
Ben Maier
Affiliation:
Department of Engineering Physics, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA
Robert Mariani
Affiliation:
Idaho National Laboratory, Idaho Falls, Idaho 83402, USA
David Bai
Affiliation:
Idaho National Laboratory, Idaho Falls, Idaho 83402, USA
Kumar Sridharan*
Affiliation:
Department of Engineering Physics, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA
*
a) Address all correspondence to this author. e-mail: kumar@engr.wisc.edu
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Abstract

The oxidation behavior of bulk ZrSi2 at 700, 1000, and 1200 °C in ambient air has been investigated. Parabolic to cubic oxide layer growth kinetics was confirmed by weight gain measurements and the average oxide layer thickness was 470 nm, 6.7 µm, and 37 µm at 700 °C, 1000 °C, and 1200 °C, respectively, after 5 h oxidation tests. Evolution of compositionally modulated nano/micro structures was confirmed in the oxide layer. At 700 °C, Si diffusion resulted in discontinuous Si-rich oxide phases in amorphous Zr–Si–O matrix. At 1000 °C, complex multilayered structures such as fine and coarse irregular spinodal structures, wavy Si-rich oxide, and Si-rich islands evolved. At 1200 °C, additional nucleation of nanoscale ZrO2 particulate phase was observed. The spinodal structures were confirmed to be crystalline ZrO2 and amorphous SiO2, and the thermodynamic driving force for phase evolution has been explained by extension of liquid miscibility gap in the binary ZrO2–SiO2 phase diagram.

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Articles
Copyright
Copyright © Materials Research Society 2016 

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Footnotes

Contributing Editor: Yanchun Zhou

References

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