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Exploration of the deposition of submicrometer particles by spin-coating

Published online by Cambridge University Press:  03 March 2011

C. Doornkamp ,
C. Laszlo ,
W. Wieldraaijer  and
E.W. Kuipers
C. Doornkamp*
Affiliation:
Koninklijke/Shell Laboratorium Amsterdam, P.O. Box 38000, 1030 BN Amsterdam, The Netherlands
C. Laszlo
Affiliation:
Koninklijke/Shell Laboratorium Amsterdam, P.O. Box 38000, 1030 BN Amsterdam, The Netherlands
W. Wieldraaijer
Affiliation:
Koninklijke/Shell Laboratorium Amsterdam, P.O. Box 38000, 1030 BN Amsterdam, The Netherlands
E.W. Kuipers
Affiliation:
Koninklijke/Shell Laboratorium Amsterdam, P.O. Box 38000, 1030 BN Amsterdam, The Netherlands
*
a)Present address: Gorlaeus Laboratories, P.O. Box 9502, 2300 RA Leiden, The Netherlands.
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Abstract

The deposition of Cu, Zn, Pt, and Co precursor particles from solution onto a flat silicon wafer using a spin coater was studied. Homogeneously distributed monodisperse particles can be obtained. The dependence of particle size and number density on solution concentration and rotation frequency was investigated. Different solvents and support modifications were studied. The particles were analyzed using dark-field microscopy, scanning electron microscopy, and atomic force microscopy.

Type
Articles
Information
Journal of Materials Research , Volume 10 , Issue 2 , February 1995 , pp. 411 - 424
Copyright
Copyright © Materials Research Society 1995

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References

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