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The formation of amorphous Ni–B by solid state and ion-beam reaction

Published online by Cambridge University Press:  31 January 2011

A. N. Campbell ,
J. C. Barbour ,
C. R. Hills  and
M. Nastasi
A. N. Campbell
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
J. C. Barbour
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
C. R. Hills
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
M. Nastasi
Affiliation:
Los Alamos National Laboratory, Los Alamos, New Mexico 87545
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Abstract

An amorphous Ni–B alloy was formed at the interfaces between layers of polycrystalline nickel and amorphous boron during electron-beam deposition of Ni/B/Ni trilayer structures. Formation of the amorphous alloy appears to be thermally-assisted and, in addition, the amorphous alloy regions can be extended by post-deposition ion-beam mixing. The existence of an upper limit to the thickness of the amorphous Ni–B alloy layer which forms (40 nm) indicates that the amorphous layer serves as a reaction or diffusion barrier. It has been shown for the first time that an amorphous metal-boron alloy is produced by thermal solid state amorphization reaction (SSAR).

Type
Materials Communications
Information
Journal of Materials Research , Volume 4 , Issue 6 , December 1989 , pp. 1303 - 1306
Copyright
Copyright © Materials Research Society 1989

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References

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