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Hard multilayered thin films of metal–intermetallic Ni/Ni3Al

Published online by Cambridge University Press:  31 January 2011

X. K. Meng ,
H. Vehoff  and
A. H. W. Ngan
X. K. Meng*
Affiliation:
Institute of Materials Science and Methods, University of Saarland, 66041 Saarbrücken, Germany, and Department of Materials Science and Engineering, Nanjing University, Nanjing 210093, People's Republic of China
H. Vehoff
Affiliation:
Institute of Materials Science and Methods, University of Saarland, 66041 Saarbrücken, Germany, and Department of Materials Science and Engineering, Nanjing University, Nanjing 210093, People's Republic of China
A. H. W. Ngan
Affiliation:
Department of Mechanical Engineering, University of Hong Kong, Pokfulam Road, Hong Kong, Peoples’ Republic of China
*
a)x.meng@matsci.uni-sb.de or x.k.meng@nju.edu.cn
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Abstract

Metal–intermetallic Ni/Ni3Al multilayered thin films were synthesized by the magnetron sputtering technique. The synthesized films possessed high hardness that could be compared with intermetallic Ni3Al films. The constituent layers of Ni and Ni3Al were fully adherent to one another at the multilayered boundaries. The fracture surface of the multilayered films on bending showed the characteristics of local ductile fracture. This novel type of multilayered thin films is expected to be used as hard coatings and miniaturized parts of apparatus in micro-electromechanical systems.

Type
Rapid Communications
Information
Journal of Materials Research , Volume 15 , Issue 12 , December 2000 , pp. 2595 - 2597
Copyright
Copyright © Materials Research Society 2000

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References

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