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Hydride precipitation in vapor deposited Ti thin films

Published online by Cambridge University Press:  31 January 2011

S.R. Peddada ,
I.M. Robertson  and
H.K. Birnbaum
S.R. Peddada
Affiliation:
Department of Materials Science and Engineering and Materials Research Laboratory, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
I.M. Robertson
Affiliation:
Department of Materials Science and Engineering and Materials Research Laboratory, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
H.K. Birnbaum
Affiliation:
Department of Materials Science and Engineering and Materials Research Laboratory, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
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Abstract

Titanium hydrides having two different crystal structures were observed in α–Ti thin films grown epitaxially on sapphire substrates by e-beam physical vapor deposition. One of the hydrides (γ-hydride) had a face-centered tetragonal structure (c/a > 1) with an ordered arrangement of hydrogen atoms. The second hydride formed was the fcc δ-hydride. The γ-hydride grew as platelets in the α–Ti lattice with {10$\overline 1$0}Ti habit planes, whereas the γ-hydrides formed directly on the sapphire substrate parallel to the (0001)Ti. These hydrides are one of the principal causes of film decohesion.

Type
Articles
Information
Journal of Materials Research , Volume 8 , Issue 2 , February 1993 , pp. 291 - 296
Copyright
Copyright © Materials Research Society 1993

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References

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