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Nanoscale mechanical patterning for the selective deposition of nanostructures

Published online by Cambridge University Press:  31 January 2011

C. A. Friesen  and
J. R. Hayes
C. A. Friesen*
Affiliation:
Department of Materials Science and Engineering, Arizona State University, Tempe, Arizona 85287
J. R. Hayes
Affiliation:
Department of Materials Science and Engineering, Arizona State University, Tempe, Arizona 85287
*
a)Address all correspondence to this author.codyf@mit.edu
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Abstract

In this paper, we describe a new method for creating nanostructures, and demonstrate its use by depositing Au, Ni, and Zn on a SiO2 passivated Si substrate. The method combined the spatial control of electron-beam lithography with the ease of fabrication of self-assembled arrays. The technique enabled the selective electrochemical deposition of nanostructures by creating specific nucleation sites by nanoindentation. This offered the possibility of accurately creating nanostructures ranging in size from one to hundreds of nanometers. We showed that it is possible to electrically isolate the nanostructures from the substrate and each other by a thermal oxidation process. In principle, this technique allowed fabrication of quantum devices of any geometry.

Type
Articles
Information
Journal of Materials Research , Volume 15 , Issue 12 , December 2000 , pp. 2684 - 2689
Copyright
Copyright © Materials Research Society 2000

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