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On-line gas-phase optical diagnostics in plasma CVD deposition of carbon films

Published online by Cambridge University Press:  31 January 2011

R. Fantoni ,
M. Giorgi ,
A.G.G. Moliterni ,
W.C.M. Berden ,
V. Lazic ,
O. Martini  and
F. Polla Mattiot
R. Fantoni
Affiliation:
ENEA, Area INN, Dip. Sviluppo tecnologie di Punta, P. O. Box 65, 00044 Frascati (RM), Italy
M. Giorgi
Affiliation:
ENEA, Area INN, Dip. Sviluppo tecnologie di Punta, P. O. Box 65, 00044 Frascati (RM), Italy
A.G.G. Moliterni
Affiliation:
ENEA, Area INN, Dip. Sviluppo tecnologie di Punta, P. O. Box 65, 00044 Frascati (RM), Italy
W.C.M. Berden
Affiliation:
ENEA, Area INN, Dip. Sviluppo tecnologie di Punta, P. O. Box 65, 00044 Frascati (RM), Italy
V. Lazic
Affiliation:
ENEA, Area INN, Dip. Sviluppo tecnologie di Punta, P. O. Box 65, 00044 Frascati (RM), Italy
O. Martini
Affiliation:
Eniricerche S.p.A., 00015 Monterotondo (RM), Italy
F. Polla Mattiot
Affiliation:
Eniricerche S.p.A., 00015 Monterotondo (RM), Italy
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Abstract

Space resolved, on-line spontaneous and stimulated emission, and CARS diagnostics have been employed on CH4/H2 mixtures excited by rf-discharge in order to investigate the chemical processes and the gas phase kinetics in the plasma. CH4 and H2 concentration and temperature have been monitored during the process as a function of main reaction parameters (rf-power, total pressure, CH4/H2 ratio). Formation of CH,H2, and H in excited states has been observed. On the basis of present spectroscopic data, a model for the gas-phase reactions accompanying the carbon film deposition is proposed.

Type
Articles
Information
Journal of Materials Research , Volume 7 , Issue 5 , May 1992 , pp. 1204 - 1214
Copyright
Copyright © Materials Research Society 1992

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