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Optical emission spectroscopy during the bias-enhanced nucleation of diamond microcrystals by microwave plasma chemical vapor deposition process

Published online by Cambridge University Press:  31 January 2011

H. C. Barshilia ,
B. R. Mehta  and
V. D. Vankar
H. C. Barshilia
Affiliation:
Thin Film Laboratory, Department of Physics, Indian Institute of Technology, New Delhi 110 016, India
B. R. Mehta
Affiliation:
Thin Film Laboratory, Department of Physics, Indian Institute of Technology, New Delhi 110 016, India
V. D. Vankar
Affiliation:
Thin Film Laboratory, Department of Physics, Indian Institute of Technology, New Delhi 110 016, India
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Abstract

Microwave plasma chemical vapor deposition (MWPCVD) process has been used to grow diamond thin films on silicon substrates from CH4–H2 gas mixture. Bias-enhanced nucleation (BEN) pretreatment has been used to increase the density of diamond nuclei. Various species in the CH4–H2 plasma have been identified using optical emission spectroscopy (OES), and their effect on the film microstructure has been studied. During the pretreatment process the emission intensities of CH, CH+, C2, H, and H2* species have been found to increase significantly for a negative dc bias voltage |VB| > 60 V. The higher concentration of excited species and the associated effects play a significant role in the growth process. A very thin layer of a-C containing predominant sp3 bonded carbon species in the initial stages of the growth is found to be present in these films. The microstructure of the films has been found to be very sensitive to the biasing conditions.

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Articles
Information
Journal of Materials Research , Volume 11 , Issue 11 , November 1996 , pp. 2852 - 2860
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

1.Jiang, X., Boettger, E., Paul, M., and Klages, C-P., Appl. Phys. Lett. 65 (12), 1519 (1994).CrossRefGoogle Scholar
2.Ihara, M., Komiyama, H., and Okubo, T., Appl. Phys. Lett. 65 (9), 192 (1994).CrossRefGoogle Scholar
3.Barshilia, H. C., Mehta, B. R., and Vankar, V. D., J. Mater. Res. 11, 1019 (1996).CrossRefGoogle Scholar
4.Park, Y. S., Kim, S. H., and Lee, J.W., Jpn. J. Appl. Phys. 33 (11), 6320 (1994).CrossRefGoogle Scholar
5.Feng, Z., Komvopoulos, K., Brown, I. G., and Bogy, D. B., J. Mater. Res. 9, 2148 (1994).CrossRefGoogle Scholar
6.Dubray, J. J., Pantano, C. G., Meloncelli, M., and Bertran, E., J. Vac. Sci. Technol. A 9 (6), 3012 (1991).CrossRefGoogle Scholar
7.Barnes, P. N. and Wu, R. L. C., Appl. Phys. Lett. 62 (1), 37 (1993).CrossRefGoogle Scholar
8.Chow, L., Horner, A., Sakouri, H., Roughani, B., and Sundaram, S., J. Mater. Res. 7, 1606 (1992).CrossRefGoogle Scholar
9.Meilunas, R. J., Chang, R. P. H., Liu, S., and Kappes, M. M., Appl. Phys. Lett. 59 (26), 3461 (1991).CrossRefGoogle Scholar
10.Hartnett, T., Miller, R., Montanari, D., Willingham, C., and Tustison, R., J. Vac. Sci. Technol. A 8 (3), 2129 (1990).CrossRefGoogle Scholar
11.Yugo, S., Kanai, T., Kimura, T., and Muto, T., Appl. Phys. Lett. 58 (10), 1036 (1991).CrossRefGoogle Scholar
12.Yugo, S., Kanai, T., and Kimura, T., Diamond Relat. Mater. 1, 388 (1992).CrossRefGoogle Scholar
13.Katoh, M., Aoki, M., and Kawarada, H., Jpn. J. Appl. Phys. 33, (2A), L194 (1994).CrossRefGoogle Scholar
14.Wolter, S. D., Glass, J. T., and Stoner, B. R., Thin Solid Films 261, 4 (1995).CrossRefGoogle Scholar
15.Sheldon, B. W., Csencsits, R., Rankin, J., Boekenhauer, R. E., and Shigesato, Y., J. Appl. Phys. 75, (10), 5001 (1994).CrossRefGoogle Scholar
16.Arezzo, F., Zacchetti, N., and Zhu, W., J. Appl. Phys. 75 (10), 5375 (1994).CrossRefGoogle Scholar
17.Wolter, S. D., Stoner, B. R., Glass, J. T., Ellis, P. E., Buhaenko, D. S., Jenkins, C. E., and Southworth, P., Appl. Phys. Lett. 62 (11), 1215 (1993).CrossRefGoogle Scholar
18.Stoner, B. R., Williams, B. E., Wolter, S. D., Nishimura, K., and Glass, J.T., J. Mater. Res. 7, 257 (1992).CrossRefGoogle Scholar
19.Lauten, F. S., Shigesato, Y., and Sheldon, B. W., Appl. Phys. Lett. 65 (2), 210 (1994).CrossRefGoogle Scholar
20.Stoner, B. R., Ma, G. H. M., Wolter, S. D., and Glass, J.T., Phys. Rev. B. 45 (19), 11 067 (1992).CrossRefGoogle Scholar
21.Jiang, X., Klages, C-P., Zachai, R., Hartweg, M., and Fusser, H. J., Appl. Phys. Lett. 62 (26), 3438 (1993).CrossRefGoogle Scholar
22.Narayan, J., Srivatsa, A. R., Peters, M., Yokota, S., and Ravi, K. V., Appl. Phys. Lett. 53 (19), 1823 (1988).CrossRefGoogle Scholar
23.Chang, L., Lin, T. S., Chen, J. L., and Chen, F. R., Appl. Phys. Lett. 62 (26), 3444 (1993).CrossRefGoogle Scholar
24.Wolter, S. D., McClure, M. T., Glass, J. T., and Stoner, B. R., Appl. Phys. Lett. 66 (21), 2810 (1995).CrossRefGoogle Scholar
25.Stoner, B. R. and Glass, J. T., Appl. Phys. Lett. 60 (6), 698 (1992).CrossRefGoogle Scholar
26.Kohl, R., Wild, C., Herres, N., Koidl, P., Stoner, B. R., and Glass, J. T., Appl. Phys. Lett. 63 (13), 1792 (1993).CrossRefGoogle Scholar
27.McGinnis, S. P., Kelly, M. A., and Hagstrom, S. B., Appl. Phys. Lett. 66 (23), 3117 (1995).CrossRefGoogle Scholar
28.Robertson, J., Gerber, J., Sattel, S., Weiler, M., Jung, K., and Ehrhardt, H., Appl. Phys. Lett. 66 (24), 3287 (1995).CrossRefGoogle Scholar
29.Balestrino, G., Marinelli, M., Milani, E., Paoletti, A., Pinter, I., Tebano, A., and Paroli, P., Appl. Phys. Lett. 62 (8), 879 (1993).CrossRefGoogle Scholar
30.Marinelli, M., Milani, E., Montuori, M., Paoletti, A., Tebano, A., and Paroli, P., J. Appl. Phys. 76 (10), 5702 (1994).CrossRefGoogle Scholar
31.Muranaka, Y., Yamashita, H., and Miyadera, H., J. Mater. Sci. 26, 3235 (1991).CrossRefGoogle Scholar
32.Muranaka, Y., Yamashita, H., Sato, K., and Miyadera, H., J. Appl. Phys. 67 (10), 6247 (1990).CrossRefGoogle Scholar
33.Mucha, J. A., Flamm, D. L., and Ibbotson, D. E., J. Appl. Phys. 65 (9), 3448 (1989).CrossRefGoogle Scholar
34.Kampas, F. J., J. Appl. Phys. 54 (5), 2276 (1983).CrossRefGoogle Scholar
35.Manukonda, R., Dillon, R., and Furtak, T., J. Vac. Sci. Technol. A 13 (3), 1150 (1995).CrossRefGoogle Scholar
36.Tahara, H., Minami, K., Murai, A., Yasui, T., and Yoshikawa, T., Jpn. J. Appl. Phys. 34 (4A), 1972 (1995).CrossRefGoogle Scholar
37.Reeve, S. W. and Weimer, W. A., J. Vac. Sci. Technol. A 13 (2), 359 (1995).CrossRefGoogle Scholar
38.Pastol, A. and Catherine, Y., J. Phys. D: Appl. Phys. 23, 799 (1990).CrossRefGoogle Scholar
39.Wagner, J., Wild, C., Pohl, F., and Koidl, P., Appl. Phys. Lett. 48 (2), 106 (1986).CrossRefGoogle Scholar
40.Reeve, S. W. and Weimer, W. A., Thin Solid Films 236, 91 (1993).CrossRefGoogle Scholar
41.Coburn, J. W. and Chen, M., J. Appl. Phys. 51 (6), 3134 (1980).CrossRefGoogle Scholar
42.Lochte-Holtgreven, W., Plasma Diagnostics (North-Holland Publishing Company, Amsterdam, 1968), p. 181.Google Scholar
43.Shigesato, Y., Boekenhauer, R. E., and Sheldon, B. W., Appl. Phys. Lett. 63 (3), 314 (1993).CrossRefGoogle Scholar
44.Herzberg, G., Molecular Spectra and Molecular Structure I. Spectra of Diatomic Molecules, 2nd ed. (Van Nostrand Reinhold, New York, 1950), p. 519.Google Scholar
45.Pearse, R. W. B. and Gaydon, A. G., The Identification of Molecular Spectra, 4th ed. (Chapman and Hall, London, 1976), pp. 83, 169.CrossRefGoogle Scholar
46.Striganov, A. R. and Sventitskii, N. S., Tables of Spectral Lines of Neutral and Ionized Atoms (IFI/Plenum, New York, 1968), pp. 73, 892.CrossRefGoogle Scholar
47.Huber, K. P. and Herzberg, G., Molecular Spectra and Molecular Structure, IV. Constants of Diatomic Molecules (Van Nostrand Reinhold, New York, 1979), pp. 112, 140, 240.CrossRefGoogle Scholar
48.Mitsuda, Y., Kojima, Y., Yoshida, T., and Akashi, K., J. Mater. Sci. 22, 1557 (1987).CrossRefGoogle Scholar
49.Herzberg, G., Molecular Spectra and Molecular Structure, III. Electronic Spectra and Electronic Structure of Polyatomic Molecules (Van Nostrand, NJ, 1967), p. 609.Google Scholar
50.Savvides, N., J. Appl. Phys. 59 (12), 4133 (1986).CrossRefGoogle Scholar
51.McNamara, K. M., Williams, B. E., Gleason, K. K., and Scruggs, B. E., J. Appl. Phys. 76 (4), 2466 (1994).CrossRefGoogle Scholar
52.Angus, J. C. and Hayman, C. C., Science 241, 913 (1988).CrossRefGoogle Scholar
53.Yarbrough, W. A. and Messier, R., Science 247, 688 (1990).CrossRefGoogle Scholar
54.Frenklach, M., J. Appl. Phys. 65 (12), 5142 (1989).CrossRefGoogle Scholar