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Properties of carbon films deposited by pulsed laser vaporization from pyrolytic graphite

Published online by Cambridge University Press:  31 January 2011

A. P. Malshe ,
S. M. Chaudhari ,
S. M. Kanetkar ,
S. B. Ogale ,
S. V. Rajarshi  and
S. T. Kshirsagar
A. P. Malshe
Affiliation:
Department of Physics, University of Poona, Pune-411007, India
S. M. Chaudhari
Affiliation:
Department of Physics, University of Poona, Pune-411007, India
S. M. Kanetkar
Affiliation:
Department of Physics, University of Poona, Pune-411007, India
S. B. Ogale
Affiliation:
Department of Physics, University of Poona, Pune-411007, India
S. V. Rajarshi
Affiliation:
School of Energy Studies, University of Poona, Pune-411007, India
S. T. Kshirsagar
Affiliation:
National Chemical Laboratory, Pune-411007, India
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Abstract

Amorphous carbon films have been deposited on silicon 〈111〉 and quartz substrates by pulsed ruby laser vaporization from pyrolytic graphite. Depositions have been carried out at different substrate temperatures, and the properties of the deposited carbon films have been studied using IR and UV–VIS transmission, ellipsometry, and laser-Raman spectroscopies. Chemical and electrical resistivity measurements have also been performed. It is shown that the film properties depend critically on the substrate temperature and that at the substrate temperature of 50 °C films with substantial proportion of sp3 hybridized orbitals are obtained.

Type
Articles
Information
Journal of Materials Research , Volume 4 , Issue 5 , October 1989 , pp. 1238 - 1242
Copyright
Copyright © Materials Research Society 1989

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References

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