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Study of fluoride induced dissimilar metal corrosion in a microelectromechanical system

Published online by Cambridge University Press:  31 January 2011

Jagdish Prasad ,
Oliver M. R. Chyan ,
Jin-Jian Chen ,
Min Liu ,
Ligang Chen  and
Fei Xu
Jagdish Prasad
Affiliation:
Manufacturing Science and Technology Center, Texas Instruments/SEMATECH, Dallas, Texas 75265
Oliver M. R. Chyan*
Affiliation:
Department of Chemistry, University of North Texas, Denton, Texas 76203
Jin-Jian Chen
Affiliation:
Department of Chemistry, University of North Texas, Denton, Texas 76203
Min Liu
Affiliation:
Department of Chemistry, University of North Texas, Denton, Texas 76203
Ligang Chen
Affiliation:
Department of Chemistry, University of North Texas, Denton, Texas 76203
Fei Xu
Affiliation:
Department of Chemistry, University of North Texas, Denton, Texas 76203
*
a)Address all the correspondence to Dr. Oliver Chyan, Tel: (817)565-3463, Fax: (817)565-3463, E-mail: Chyan@unt.edu.
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Abstract

This paper reports a study of microscopic on-chip corrosion on a 17 μm × 17 μm microelectromechanical device. The active atmospheric corrosion occurred only on the Al−Si−Ti components which were connected directly to the TiW components. Adsorbed fluoride ionic species on the microelectromechanical device were found to activate the observed bimetallic corrosion on the Al−Si−Ti/TiW contacts. Water rinse or replacement of TiW by TiAlx completely eliminates the active corrosion. Electrochemical potential data confirm the dissimilar metal corrosion mechanism. Effective prevention of on-chip corrosion was achieved by the judicious design of the device components to avoid dissimilar metal contacts with large galvanic potential differences.

Type
Articles
Information
Journal of Materials Research , Volume 12 , Issue 12 , December 1997 , pp. 3241 - 3245
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. (a) Mautz, K. E., Electrochemical Society Extended Abstracts 96–2, 1996 (Electrochemical Society, Pennington, NJ, 1996), abstracts nos. 217 and 218; (b) K. E. Mautz, Plasma Process. IX, 92–18, 360 (1992); (c) K. E. Mautz, Proc. of 2nd Int. Symp. Corr. Rel. Electron. Mater. Dev. 93–1, 64 (1993).Google Scholar
2.Lee, W. Y., Eldridge, J. M., and Schwartz, G. C., J. Appl. Phys. 52, 2994 (1981).CrossRefGoogle Scholar
3.Ishida, T., Fujiwara, N., Yoneda, M., Nakamoto, K., and Horie, K., Jpn. J. Appl. Phys. 31, 2045 (1992).CrossRefGoogle Scholar
4.Hayasaka, N., Koga, Y., Shimomura, K., Yoshida, Y., and Dkane, H., Proc. 12th Symp. Dry Process, 147 (1990).Google Scholar
5.Maa, J., Gossenberger, H., and Paff, R. J., J. Vac. Sci. Technol. B8, 1052 (1990).CrossRefGoogle Scholar
6.Kitcher, J. R., Electrochemical Society Extended Abstracts 80–2, 1980 (Electrochemical Society, Pennington, NJ, 1980), abstracts no. 329.Google Scholar
7.Donnelly, V. M. and Flamm, D. L., Solid State Technol. 24, 161 (1981).Google Scholar
8.Tsukada, T., Yasuda, K., Wani, E., and Ukai, K., Proc. of 4th Symp. Plasma Processing 1983 (Electrochemical Society, Pennington, NJ, 1983), Vol. 85–10, p. 341.Google Scholar
9.Chang, P. C. and Chao, K. K., Proc. of 5th Symp. Plasma Processing 1985 (Electrochemical Society, Pennington, NJ, 1985), Vol. 85-1, p. 12.Google Scholar
10.Wranglen, G., Introduction to Corrosion and Protection of Metals (Chapman and Hall, New York, 1985), p. 58.CrossRefGoogle Scholar
11.Feather, G. A. and Monk, D. W., in IEEE 1995 Int. Conf. on Wafer Scale Integration, 43–51 (1995).Google Scholar
12.Tachibana, K., Furukawa, A., Mizushiro, M. A., and Kumagai, Y., Electrochemical Society Extended Abstracts 96–2, 1996 (Electrochemical Society, Pennington, NJ, 1996) abstracts no. 187.Google Scholar
13.Morris, P. E. and Scarberry, R. C., Corrosion 28 (12), 444 (1972).CrossRefGoogle Scholar
14.1980 Annual Book of ASTM Standards, Part 10, G1, G3, and G5 (American Society for Testing and Materials, Philadelphia, PA).Google Scholar
15.Fontana, M. G. and Greene, N. D., Corrosion Engineering (McGraw-Hill, New York, 1967).Google Scholar