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Thickness dependence of microstructural evolution of ZnO films deposited by rf magnetron sputtering

Published online by Cambridge University Press:  31 January 2011

Yong Eui Lee ,
Young Jin Kim  and
Hyeong Joon Kim
Yong Eui Lee
Affiliation:
Inter-University Semiconductor Research Center (ISRC) and School of Material Science and Engineering, Seoul National University, Seoul 151–742, Korea
Young Jin Kim
Affiliation:
Department of Elec. and Advanced Materials Engineering, Kyonggi University, Suwon 440–760, Korea
Hyeong Joon Kim
Affiliation:
Inter-University Semiconductor Research Center (ISRC) and School of Material Science and Engineering, Seoul National University, Seoul 151–742, Korea
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Abstract

The microstructural evolution, including preferred orientation and surface morphology, of ZnO films deposited by rf magnetron sputtering was investigated with increasing film thickness. Preferred orientation of the ZnO films changed from (0002) → (1011) → (1120) and fine and dense columnar grains also changed to large elongated grains with increasing thickness. Such selective texture growth was explained with an effect of highly energetic species bombardment on the growing film surface. The relationship between preferred orientation change and microstructural evolution was also discussed.

Type
Articles
Information
Journal of Materials Research , Volume 13 , Issue 5 , May 1998 , pp. 1260 - 1265
Copyright
Copyright © Materials Research Society 1998

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