Hostname: page-component-7bb8b95d7b-qxsvm Total loading time: 0 Render date: 2024-10-06T16:23:43.730Z Has data issue: false hasContentIssue false
  • English
  • Français

Very high pressure sintering of cBN fine particles coated with TiN–TiB2 layer formed by disproportionation reaction in molten salts

Published online by Cambridge University Press:  31 January 2011

Haruo Yoshida  and
Shoichi Kume
Haruo Yoshida*
Affiliation:
National Institute for Advanced Interdisciplinary Research (NAIR), Tsukuba, Ibaraki 305, Japan
Shoichi Kume
Affiliation:
National Industrial Research Institute of Nagoya (NIRIN), 1-1 Hirate-cho, Kita-ku, Nagoya 462, Japan
*
b)All correspondence should be addressed to this author.
Get access

Abstract

Sintering of a fine cubic boron nitride (cBN) particle with a grain size of less than 2 μm was successfully carried out under 5.5 GPa pressure at 1720 K for 30 min. TiN–TiB2-coated cBN particles were used as the starting powder without adding any other binding materials. The coating was carried out by dipping the cBN particles in molten salts. The obtained cBN sintered compact shows a smooth microstructure with a well-controlled grain boundary; TiN–TiB2 is distributed over the cBN-grain boundary in the shape of a net mesh similar to tiled floors. The Vickers microhardness of the obtained compact was found to be higher than that of commercially available typical cBN-cutting tools.

Type
Articles
Information
Journal of Materials Research , Volume 12 , Issue 3 , March 1997 , pp. 585 - 588
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Bundy, F. P. and Wentorf, R. H. Jr, J. Chem. Phys. 38, 114 (1963).Google Scholar
2.Modern Very High Pressure Technique, edited by Wentorf, R. H. Jr, (Butterworths Inc., Washington, DC, 1962).Google Scholar
3.Kumazawa, M., High Temp. High Pressures 5, 599 (1973).Google Scholar
4.Steinman, J. B., Warnock, R. V., Root, C. G., and Stetson, A. R., J. Electrochem. Soc. 114, 1018 (1967).CrossRefGoogle Scholar
5. Japanese Patent Public Disclosure, Hei 1(1989)-207380.Google Scholar
6. Japanese Patent Public Disclosure, Hei 1(1989)-234168.Google Scholar
7. For example, Abe, T. and Yamashina, T., Thin Solid Films 30, 19 (1975).CrossRefGoogle Scholar
8. For example, Niihara, K. and Hirai, T., J. Mater. Sci. 11, 593 (1976).CrossRefGoogle Scholar