Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Puurunen, Riikka L.
2005.
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process.
Journal of Applied Physics,
Vol. 97,
Issue. 12,
Aaltonen, Titta
Ritala, Mikko
and
Leskelä, Markku
2005.
ALD of Rhodium Thin Films from Rh(acac)[sub 3] and Oxygen.
Electrochemical and Solid-State Letters,
Vol. 8,
Issue. 8,
p.
C99.
Kemell, Marianna
Pore, Viljami
Ritala, Mikko
Leskelä, Markku
and
Lindén, Mika
2005.
Atomic Layer Deposition in Nanometer-Level Replication of Cellulosic Substances and Preparation of Photocatalytic TiO2/Cellulose Composites.
Journal of the American Chemical Society,
Vol. 127,
Issue. 41,
p.
14178.
Färm, E.
Kemell, M.
Ritala, M.
and
Leskelä, M.
2006.
Self‐Assembled Octadecyltrimethoxysilane Monolayers Enabling Selective‐Area Atomic Layer Deposition of Iridium.
Chemical Vapor Deposition,
Vol. 12,
Issue. 7,
p.
415.
Park, K. J.
and
Parsons, G. N.
2006.
Selective area atomic layer deposition of rhodium and effective work function characterization in capacitor structures.
Applied Physics Letters,
Vol. 89,
Issue. 4,
Chen, R.
and
Bent, S. F.
2006.
Chemistry for Positive Pattern Transfer Using Area‐Selective Atomic Layer Deposition.
Advanced Materials,
Vol. 18,
Issue. 8,
p.
1086.
Chen, Rong
and
Bent, Stacey F.
2006.
Highly Stable Monolayer Resists for Atomic Layer Deposition on Germanium and Silicon.
Chemistry of Materials,
Vol. 18,
Issue. 16,
p.
3733.
Kemell, M.
Pore, V.
Ritala, M.
and
Leskelä, M.
2006.
Ir/Oxide/Cellulose Composites for Catalytic Purposes Prepared by Atomic Layer Deposition.
Chemical Vapor Deposition,
Vol. 12,
Issue. 7,
p.
419.
Elam, J.W.
Zinovev, A.
Han, C.Y.
Wang, H.H.
Welp, U.
Hryn, J.N.
and
Pellin, M.J.
2006.
Atomic layer deposition of palladium films on Al2O3 surfaces.
Thin Solid Films,
Vol. 515,
Issue. 4,
p.
1664.
Kwon, Se-Hun
Kwon, Oh-Kyum
Min, Jae-Sik
and
Kang, Sang-Won
2006.
Plasma-Enhanced Atomic Layer Deposition of Ru–TiN Thin Films for Copper Diffusion Barrier Metals.
Journal of The Electrochemical Society,
Vol. 153,
Issue. 6,
p.
G578.
Räisänen, Minna T.
Kemell, Marianna
Leskelä, Markku
and
Repo, Timo
2007.
Oxidation of Elemental Gold in Alcohol Solutions.
Inorganic Chemistry,
Vol. 46,
Issue. 8,
p.
3251.
Kemell, Marianna
Ritala, Mikko
Leskelä, Markku
Ossei-Wusu, Emmanuel
Carstensen, Jürgen
and
Föll, Helmut
2007.
Si/Al2O3/ZnO:Al capacitor arrays formed in electrochemically etched porous Si by atomic layer deposition.
Microelectronic Engineering,
Vol. 84,
Issue. 2,
p.
313.
Jiang, Xirong
Chen, Rong
and
Bent, Stacey F.
2007.
Spatial control over atomic layer deposition using microcontact-printed resists.
Surface and Coatings Technology,
Vol. 201,
Issue. 22-23,
p.
8799.
Kim, Seong Keun
Lee, Sang Young
Lee, Sang Woon
Hwang, Gyu Weon
Hwang, Cheol Seong
Lee, Jin Wook
and
Jeong, Jaehack
2007.
Atomic Layer Deposition of Ru Thin Films Using 2,4-(Dimethylpentadienyl)(ethylcyclopentadienyl)Ru by a Liquid Injection System.
Journal of The Electrochemical Society,
Vol. 154,
Issue. 2,
p.
D95.
Jiang, Xirong
and
Bent, Stacey F.
2007.
Area-Selective Atomic Layer Deposition of Platinum on YSZ Substrates Using Microcontact Printed SAMs.
Journal of The Electrochemical Society,
Vol. 154,
Issue. 12,
p.
D648.
Wang, Lidong
and
Griffin, Gregory L.
2007.
Batch CVD Process for Depositing Pd Activation Layers.
Journal of The Electrochemical Society,
Vol. 154,
Issue. 3,
p.
D151.
Kim, Sung-Wook
Kwon, Se-Hun
Kwak, Dong-Kee
and
Kang, Sang-Won
2008.
Phase control of iridium and iridium oxide thin films in atomic layer deposition.
Journal of Applied Physics,
Vol. 103,
Issue. 2,
Hämäläinen, Jani
Munnik, Frans
Ritala, Mikko
and
Leskelä, Markku
2008.
Atomic Layer Deposition of Platinum Oxide and Metallic Platinum Thin Films from Pt(acac)2 and Ozone.
Chemistry of Materials,
Vol. 20,
Issue. 21,
p.
6840.
Kim, Sung-Wook
Kwon, Se-Hun
Jeong, Seong-Jun
and
Kang, Sang-Won
2008.
Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD.
Journal of The Electrochemical Society,
Vol. 155,
Issue. 11,
p.
H885.
Hämäläinen, Jani
Kemell, Marianna
Munnik, Frans
Kreissig, Ulrich
Ritala, Mikko
and
Leskelä, Markku
2008.
Atomic Layer Deposition of Iridium Oxide Thin Films from Ir(acac)3 and Ozone.
Chemistry of Materials,
Vol. 20,
Issue. 9,
p.
2903.