Hostname: page-component-84b7d79bbc-4hvwz Total loading time: 0 Render date: 2024-07-29T21:03:23.392Z Has data issue: false hasContentIssue false

A new method to study cyclic deformation of thin films in tension and compression

Published online by Cambridge University Press:  31 January 2011

M. Hommel
Affiliation:
Max-Planck-Institut für Metallforschung, Seestrasse 92, D-70174 Stuttgart, Germany
O. Kraft
Affiliation:
Max-Planck-Institut für Metallforschung, Seestrasse 92, D-70174 Stuttgart, Germany
E. Arzt
Affiliation:
Max-Planck-Institut für Metallforschung, Seestrasse 92, D-70174 Stuttgart, Germany
Get access

Abstract

In this paper, a new method to study cyclic plastic deformation in thin metal films is presented. Cu films were deposited onto compliant substrates allowing the film to be subjected to tensile and compressive stresses on loading and unloading of the film/substrate composite. The film stress was measured in situ by x-ray diffraction. First results lend to characteristic stress-strain hysteresis curves, indicative of fatigue processes in small dimensions.

Type
Articles
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Ruud, J. A., Josell, D., Spaepen, F., and Greer, A. L., J. Mater. Res. 8, 112 (1993).CrossRefGoogle Scholar
2.Schadler, L.S. and Noyan, I.C., Appl. Phys. Lett. 66, 22 (1995).CrossRefGoogle Scholar
3.Baker, S.P. and Nix, W. D., J. Mater. Res. 9, 3145 (1994).CrossRefGoogle Scholar
4.Weihs, T.P., Hong, S., Bravman, J.C., and Nix, W.D., J. Mater. Res. 3, 931 (1988).CrossRefGoogle Scholar
5.Flinn, P.A., Gardner, D. S., and Nix, W.D., IEEE Trans. Electron Devices ED–34, 689 (1987).CrossRefGoogle Scholar
6.Venkatraman, R. and Bravman, J.C., J. Mater. Res. 7, 2040 (1992).CrossRefGoogle Scholar
7.Bader, S., Flinn, P. A., Arzt, E., and Nix, W. D., J. Mater. Res. 9, 318 (1994).CrossRefGoogle Scholar
8.Keller, R-M., Baker, S.P., and Arzt, E., J. Mater. Res. 13, 1307 (1998).CrossRefGoogle Scholar
9.Kretschmann, A., Kuschke, W-M., Baker, S. P., and Arzt, E., in Thin Films: Stresses and Mechanical Properties VI, edited by Gerberich, W.W., Gao, H., Sundgren, J-E., and Baker, S. P. (Mater. Res. Soc. Symp. Proc. 436, Pittsburgh, PA, 1997), pp. 5964.Google Scholar
10.Kuschke, W-M., Kretschmann, A., Keller, R-M., Vinci, R. P., Kauffmann, C., and Arzt, E., J. Mater. Res. (1999, in press).Google Scholar
11.Noyan, I. C. and Cohen, J.B., Residual Stress: Measurements by Diffraction and Interpretation (Springer-Verlag, New York, 1987).CrossRefGoogle Scholar
12.Besser, P.R., Brennan, S., and Bravman, J. C., J. Mater. Res. 9, 13 (1994).CrossRefGoogle Scholar
13.Landolt–Börnstein, , Numerical Data and Functional Relationship in Science and Technology–Group III, edited by Hellwege, K-H. (Springer-Verlag, New York, 1979), p. 6.Google Scholar
14.Hommel, M., unpublished results (1998).Google Scholar