Hostname: page-component-5c6d5d7d68-vt8vv Total loading time: 0.001 Render date: 2024-08-15T18:56:42.995Z Has data issue: false hasContentIssue false
  • English
  • Français

The relationship between mass transport and oxide chemistry in oxidation of Ni3Al alloys

Published online by Cambridge University Press:  31 January 2011

R.T. Haasch ,
A.M. Venezia  and
C.M. Loxton
R.T. Haasch
Affiliation:
Materials Research Laboratory, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
A.M. Venezia
Affiliation:
Materials Research Laboratory, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
C.M. Loxton
Affiliation:
Materials Research Laboratory, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
Get access

Abstract

Isotope diffusion and surface analysis has been used to investigate mass transport processes and oxide chemistry during oxidation of Ni3Al alloys in oxygen between 450 and 800 °C. In all cases, the oxide has an outer layer rich in NiO that grows by outward metal diffusion. Below 650 °C, an inner mixed oxide layer allows fast inward oxygen diffusion and growth. A porous inner layer of alumina forms at 700 °C that also allows oxide growth by oxygen in-diffusion. At 800 °C, the alumina becomes protective and halts the inner oxide growth mechanism. When macroalloyed with chromium, oxide chemistry is similar, but with an additional chromium oxide in the outer layer. There is an increased oxidation protection at temperatures ⋚600 °C that results from the inhibition of oxygen in-diffusion as an oxidation process. Above 700 °C, however, protective alumina formation is retarded and faster outward metal diffusion enhances the oxide growth rate when compared to Ni3Al.

Type
Articles
Information
Journal of Materials Research , Volume 7 , Issue 6 , June 1992 , pp. 1341 - 1349
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Liu, C. T. and Sikka, U. K., J. Met. 38, 19 (1986).Google Scholar
2.Atkinson, A. and Taylor, R. I., Philos. Mag. A 43, 979 (1981).CrossRefGoogle Scholar
3.Atkinson, A., Taylor, R. I., and Goode, P. D., Oxid. Met. 13, 519 (1979).CrossRefGoogle Scholar
4.Philibert, J., Defect and Diffusion Forum 59, 63 (1988).CrossRefGoogle Scholar
5.Kofstad, P. and Lillerud, K. P., Oxid. Met. 17, 177 (1982).CrossRefGoogle Scholar
6.Pettit, F. S., Trans. TMS-AIME 239, 1296 (1967).Google Scholar
7.Young, E. W. A., Bishop, H. E., and de, J. H. W.Wit, Surf. Interface Anal. 9, 163 (1986).CrossRefGoogle Scholar
8.Venezia, A. M., Baker, J. E., and Loxton, C. M., in Secondary Ion Mass Spectrometry VII, edited by Benninghoven, A., Evans, C. A., McKeegan, K. D., Storms, H. A., and Werner, H. W. (J. Wiley and Sons, 1990), p. 719.Google Scholar
9.Venezia, A. M. and Loxton, C. M., Surf. Interface Anal. 11, 287 (1988).CrossRefGoogle Scholar
10.Haasch, R. T. and Loxton, C. M., to be published.Google Scholar
11.Venezia, A. M., CLoxton, M., and Horton, J. A., Surf. Sci. 225, 195 (1990).CrossRefGoogle Scholar
12.Haasch, R. T. and Loxton, C. M., unpublished results.Google Scholar
13.Natasan, K., Oxid. Met. 30, 53 (1988).CrossRefGoogle Scholar
14.Doychak, J. and Rühle, M., Oxid. Met. 31, 431 (1989).CrossRefGoogle Scholar
15.Hindam, H. M. and Smeltzer, W. W., Oxid. Met. 14, 337 (1980).CrossRefGoogle Scholar