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Synthesis of Carbon Tubes Using Microwave Plasma-assisted Chemical Vapor Deposition

Published online by Cambridge University Press:  31 January 2011

Qing Zhang
Affiliation:
Microelectronics Centre, Nanyang Technological University, Singapore
S. F. Yoon
Affiliation:
Microelectronics Centre, Nanyang Technological University, Singapore
J. Ahn
Affiliation:
Microelectronics Centre, Nanyang Technological University, Singapore
Bo Gan
Affiliation:
Microelectronics Centre, Nanyang Technological University, Singapore
Rusli
Affiliation:
Microelectronics Centre, Nanyang Technological University, Singapore
Ming-Bin Yu
Affiliation:
Microelectronics Centre, Nanyang Technological University, Singapore
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Abstract

Carbon tubes were successfully produced using microwave plasma-enhanced chemical vapor deposition on silicon, quartz, and ceramic substrates. The carbon tubes, about 80–100 nm in diameter and a few tens of microns in length, were formed under methane and hydrogen plasma at 720 °C with the aid of iron oxide particles. In this approach, an average tube density of about 109 cm−2 was obtained. The crooked and nonuniform diameters of some tubes suggested that they were composed of incompletely crystallized graphitic shells due to existing defects. The characteristic of the tubes grown upward on the silicon substrate accounted for a remarkably large electron field emission current of 0.1 mA/cm2 from the surface of the tube sample at a low turn-on field of 3 V/μm.

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Articles
Copyright
Copyright © Materials Research Society 2000

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