Hostname: page-component-5c6d5d7d68-sv6ng Total loading time: 0 Render date: 2024-08-13T05:31:05.097Z Has data issue: false hasContentIssue false

The yield stress of polycrystalline thin films

Published online by Cambridge University Press:  31 January 2011

C.V. Thompson
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
Get access

Abstract

In recent experiments it has been shown that the yield stress of polycrystalline thin films depends separately on the film thickness and the grain size. It was also shown that the grain size dependence varies as the reciprocal of the grain size. In this paper an analysis is presented which leads to these results and provides a more detailed understanding of the origins of the observed behavior.

Type
Communications
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Venkatraman, R. and Bravman, J. C., J. Mater. Res. 7, 2040 (1992).CrossRefGoogle Scholar
2Nix, W.D., Metall. Trans. 20A, 2217 (1989).Google Scholar
3Ereund, L. B., J. Appl. Mech. 54, 553 (1987).Google Scholar
4Sanchez, J. E. and Arzt, E., Scripta Metall. Mater. 27, 285 (1992).CrossRefGoogle Scholar