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The possibility for a voltage measurement technique using paraelectric behavior of capacitively coupled plasmas

Published online by Cambridge University Press:  10 December 2012

K. T. A. L. BURM*
Affiliation:
PlasmAIX for Plasma Research, Heimerik 47, 2440 Geel, Belgium (Karel.Burm@gmx.net)

Abstract

An argon plasma is created from a general capacitively coupled plasma source and monitored by optical emission spectroscopy. A relation between the line intensity and the applied voltage is obtained and discussed. The plasma shows paraelectric behavior. A linear relation exists between the electric capacity of the capacitively coupled plasma and the applied voltage. This linear relation can be used in a new voltage measurement technique in which the applied voltage can be calculated from the measured line intensity.

Type
Papers
Copyright
Copyright © Cambridge University Press 2012 

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References

Boulos, M., Fauchais, P. and Pfender, E. 1994 Thermal Plasmas. New York: Plenum Press.CrossRefGoogle Scholar
Braginskii, S. I. 1965 Reviews of Plasma Physics (ed. Leontovich, M. A.). New York: Plenum Press.Google Scholar
Burm, K. T. A. L. 2005 Contrib. Plasma Phys. 45 (1), 54.CrossRefGoogle Scholar
Burm, K. T. A. L. 2007 Contrib. Plasma Phys. 47 (6), 458.CrossRefGoogle Scholar
Burm, K. T. A. L., Goedheer, W. J. and Schram, D. C. 2002 Plasma Chem. Plasma Proc. 22 (3), 413.CrossRefGoogle Scholar
de Regt, J., Tas, R. and van der Mullen, J. 1996 J. Phys. D: Appl. Phys. 29, 2404.CrossRefGoogle Scholar
Griem, H. R. 1964 Plasma Spectroscopy. New York: Mcgraw-Hill.Google Scholar
Griem, H. R. 1974 Spectral Line Broadening by Plasmas. New York: Academic.Google Scholar
Kirby, B. J. 2009 Micro- and Nanoscale Fluid Mechanics: Transport in Microfluidic Devices. Cambridge, UK: Cambridge University Press.Google Scholar
Milloy, H., Crompton, R., Rees, J. and Robertson, A. 1977 Austr. J. Phys. 30, 61.CrossRefGoogle Scholar
Sansonnens, L., Howling, A. A. and Hollenstein, Ch. 2006 Plasma Sources Sci. Technol. 15, 302313.CrossRefGoogle Scholar
Tabeling, P. and Cheng, S. 2006 Introduction to Microfluidics. Oxford, UK: Oxford University Press.Google Scholar
Timmermans, E. A. H., van de Sande, M. J. and van der Mullen, J. J. A. M. 2003 Plasma Sources Sci. Technol. 12, 324.CrossRefGoogle Scholar