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Electron heating in a multi-dipole plasma by electrostatic plugging

Published online by Cambridge University Press:  12 September 2012

M. K. MISHRA  and
A. PHUKAN
M. K. MISHRA
Affiliation:
Centre of Plasma Physics, Institute for Plasma Research, Tepesia, Sonapur, Assam-782402, India Department of Physics, Baosi Banikanta Kakati College, Nagaon, Barpeta, Assam-781311, India (mishra.mrinal@rediffmail.com)
A. PHUKAN
Affiliation:
Centre of Plasma Physics, Institute for Plasma Research, Tepesia, Sonapur, Assam-782402, India Department of Physics, Madhabdev College, Narayanpur, Lakhimpur, Assam-784164, India
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Abstract

The effect of the electrostatic confinement potential on electron number densities and electron temperatures under bi-Maxwellian approximation for electron distribution function has been studied in an electrostatically plugged multi-dipole argon plasma system. Electrostatic plugging is implemented by biasing the electrically isolated multi-dipole magnetic cage. Experimental results show that the density ratio (N) and temperature ratio (T) of the two electron groups can be controlled by changing the voltage applied to the magnetic cage. Out of the two groups of electrons, one group has the cold electrons, which are plasma electrons produced by the ionization process, and the other group has the hot primary electrons.

Type
Papers
Information
Journal of Plasma Physics , Volume 79 , Issue 2 , April 2013 , pp. 153 - 161
Copyright
Copyright © Cambridge University Press 2012

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References

Andreu, J., Sardin, G., Esteve, J. and Morenza, J. L. 1985 J. Phys. D: Appl. Phys. 18, 1339.CrossRefGoogle Scholar
Bosch, R. A. and Merlino, R. L. 1986 Rev. Sci. Instrum. 57, 2940.CrossRefGoogle Scholar
Chan, C., Intrator, T. and Hershkowitz, N. 1982 Phys. Lett. 91A, 167.CrossRefGoogle Scholar
Cho, M.-H., Hershkowitz, N. and Intrator, T. 1990 J. Appl. Phys. 67, 3254.CrossRefGoogle Scholar
Ganguli, A. and Tarey, R. D. 2002 Curr. Sci. 83, 279.Google Scholar
Godyak, V. A., Piejak, R. B. and Alexandrovich, B. M. 1993 J. Appl. Phys. 73, 3657.CrossRefGoogle Scholar
Hershkowitz, N. 1989 Plasma Diagnostics, Discharge Parameters and Chemistry, Vol. 1, Boston, MA: Academic, ch. 3.Google Scholar
Hershkowitz, N., Cho, M.-H. and Pruski, J. 1992 Plasma Source Sci. Technol. 1, 87.CrossRefGoogle Scholar
Hershkowitz, N., Hendricks, K. and Carpenter, R. T. 1982 J. Appl. Phys. 53, 4105.CrossRefGoogle Scholar
Hershkowitz, N. and Leung, K. N. 1975 Appl. Phys. Lett. 26, 607.CrossRefGoogle Scholar
Holmes, A. J. T. 1982 Rev. Sci. Instrum. 53, 1517.CrossRefGoogle Scholar
Knorr, G. and Merlino, R. L. 1984 Plasma Phys. Contr. Fusion 26, 433.CrossRefGoogle Scholar
Lang, A. and Hershkowitz, N. 1978 J. Appl. Phys. 49, 4707.CrossRefGoogle Scholar
Leung, K. N., Hershkowitz, N. and Mackenzie, K. R. 1976 Phys. Fluids 19, 1045.CrossRefGoogle Scholar
Leung, K. N., Samec, T. K. and Lamm, A. 1975 Phys. Lett. 51A, 490.CrossRefGoogle Scholar
Limpaecher, R. and MacKenzie, K. R. 1973 Rev. Sci. Instrum. 44, 726.CrossRefGoogle Scholar
MacKenzie, K. R., Taylor, R. J., Cohn, D., Ault, E. and Ikezi, H. 1971 Appl. Phys. Lett. 18, 529.CrossRefGoogle Scholar
Merlino, R. L. 2007 Am. J. Phys. 75, 1078.CrossRefGoogle Scholar
Mishra, M. K., Phukan, A., Chakraborty, M. and Goswami, K. S. 2007 Phys. Lett. A 365, 135.CrossRefGoogle Scholar
Nakamura, Y. and Nomura, Y. 1978 Phys. Lett. 65A, 415.CrossRefGoogle Scholar
Oertl, M. and Skoelv, A. 1984 Proceedings of the International Conference on Plasma Physics, Lausanne, Switzerland, 331.Google Scholar
Phukan, A., Mishra, M. K. and Chakraborty, M. 2007 J. Phys. D. Appl. Phys. 40, 3616.CrossRefGoogle Scholar
Pilling, L. S. and Carnegie, D. A. 2007 Plasma Sources Sci. Technol. 16, 570.CrossRefGoogle Scholar
Pustylnik, M., Ohno, N. and Takamura, S. 2006 Jpn. J. Appl. Phys. 45, 926.CrossRefGoogle Scholar
Ruscanu, D., Anita, V. and Popa, G. 2000 Eur. Phys. J. D 10, 449.Google Scholar
Yamazumi, T. and Ikezawa, S. 1990 Jpn. J. Appl. Phys. 29, 1807.CrossRefGoogle Scholar