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Authors' Response

Published online by Cambridge University Press:  01 August 2004

A.C. Diebold ,
B. Foran ,
C. Kisielowski ,
D.A. Muller ,
S.J. Pennycook ,
E. Principe  and
S. Stemmer
A.C. Diebold
Affiliation:
International SEMATECH
B. Foran
Affiliation:
International SEMATECH
C. Kisielowski
Affiliation:
National Center for Electron Microscopy
D.A. Muller
Affiliation:
Bell Laboratories Lucent Technologies
S.J. Pennycook
Affiliation:
Oak Ridge National Laboratories
E. Principe
Affiliation:
Applied Materials
S. Stemmer
Affiliation:
University of California-Santa Barbara
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Extract

The main purpose of the article by A.C. Diebold and coworkers (2003) is to propose a robust method for determination of gate oxide thickness. O'Keefe objects to a statement in this paper that “Lattice images do NOT depict the projected atom columns; instead, they are interference patterns of the directly transmitted beam with diffracted beams.”

Type
Letter to the Editor
Information
Microscopy and Microanalysis , Volume 10 , Issue 4 , August 2004 , pp. 399 - 400
Copyright
© 2004 Microscopy Society of America

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References

REFERENCES

Coene, W.M.J., Thust, A., Op De Beeck, M., & Van Dyck, D. (1996). Maximum likelihood method for focus-variation image reconstruction in high resolution transmission electron microscopy. Ultramicroscopy 64, 109–135.Google Scholar
Diebold, A.C., Foran, B., Kisielowski, C., Muller, D.A., Pennycook, S.J., Principe, E., Stemmer, S. (2003). Thin dielectric film thickness determination by advanced transmission electron microscopy. Microsc Microanal 9, 493–508.Google Scholar
Kirkland, E.J. (1998). Advanced Computing in Electron Microscopy. New York: Plenum Press.
Kisielowski, C., Nelson, E.C., Song, C., Kilaas, R., & Thust, A. (2000). Aberration corrected lattice imaging with sub-Angstrom resolution. Microsc Microanal 6(Suppl. 2), 16–17.Google Scholar
Lichte, H. (1991). Optimum focus for taking electron holograms. Ultramicroscopy 38, 13.Google Scholar