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Computer Analysis of Electron Diffraction From thin Films

Published online by Cambridge University Press:  02 July 2020

Warren MoberlyChan
Affiliation:
Komag, Inc., 1704 Automation Parkway, San Jose, CA, 95131
R. Kilaas
Affiliation:
Materials Science Division,Lawrence Berkeley Laboratory, 1 Cyclotron Road, Berkeley, CA, 94720
L-H. Chan
Affiliation:
Komag, Inc., 1704 Automation Parkway, San Jose, CA, 95131
T. Nolan
Affiliation:
Komag, Inc., 1704 Automation Parkway, San Jose, CA, 95131
P. Dorsey
Affiliation:
Komag, Inc., 1704 Automation Parkway, San Jose, CA, 95131
W. Cao
Affiliation:
Komag, Inc., 1704 Automation Parkway, San Jose, CA, 95131
M. Lu
Affiliation:
Komag, Inc., 1704 Automation Parkway, San Jose, CA, 95131
M. Gopal
Affiliation:
Materials Science Division,Lawrence Berkeley Laboratory, 1 Cyclotron Road, Berkeley, CA, 94720
T. Yamashita
Affiliation:
Komag, Inc., 1704 Automation Parkway, San Jose, CA, 95131
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Extract

As engineering properties are miniaturized by mo thinner films, crystallographic analyses become more appropriate by electron diffraction than XRD. Without synchrotron sources, XRD scans of such films often expose one peak at best. However, these thinner films become more suited for TEM, with less artifacts from sample preparation. XRD scans with peaks in the noise are quantitatively accepted, while vast differences in electron diffraction patterns remain unquantified. Digital recording of TEM information removes the uncertain hand waving of the darkroom; and fast, user-friendly computer processing especially removes the nonstatistical art in image analysis. This work inputs 16-bit (>65,000 gray levels) images of ring diffraction patterns into Digital Micrograph and utilizes a Rotation Average subroutine (1) to plot peak intensities.

Information storage in a hard drive utilizes sputtered thin films of HCP-Co-alloys with magnetic bits tied to the crystallographic orientation of each grain. Longitudinal-recording density and signal-to-noise can be enhanced for thin films with c-axes of all grains in plane.

Type
Electron Diffraction and Scattering
Copyright
Copyright © Microscopy Society of America

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References

1.D. M. software is manufactured by Gatan, Inc., Pleasanton, CA; and RA is a free plug-in from NCEM.Google Scholar
2.Nolan, T., Sinclair, R., Yamashita, T., & Ranjan, R., Ultramicroscopy, V47, (1992) 437.CrossRefGoogle Scholar
3.M. Gopal, , MoberlyChan, W., & De Jonghe, L., J. Matls. Sci., V32, (1997) 60016008. The NCEM staff (funded by DOE #AC03-76SF00098), & Stanford University are gratefully acknowledged.CrossRefGoogle Scholar