Hostname: page-component-7bb8b95d7b-qxsvm Total loading time: 0 Render date: 2024-09-29T09:16:18.639Z Has data issue: false hasContentIssue false
  • English
  • Français

Electrostatic Aberration Correction in LV-SEM

Published online by Cambridge University Press:  02 July 2020

D.J. Maas ,
A. Henstra ,
M.P.C.M. Krijn  and
S.A.M. Mentink
D.J. Maas
Affiliation:
Philips Research, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
A. Henstra
Affiliation:
FEI Electron Optics, PO Box 218, 5600 MD Eindhoven, The Netherlands
M.P.C.M. Krijn
Affiliation:
Philips Research, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
S.A.M. Mentink
Affiliation:
Philips Research, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands
Get access

Extract

The resolution of a low-voltage electron microscope is limited by the chromatic and spherical aberration of the objective lens, see Fig. 1. The design of state-of-the-art objective lenses is optimised for minimal aberrations. Any significant improvement of the resolution requires an aberration corrector. Recently, correction of both Cc and Cs has been demonstrated in SEM, using a combination of magnetic and electrostatic quadrupoles and octupoles (Zach and Haider, 1995). The present paper presents an alternative design, which is based on a purely electrostatic concept, potentially simplifying the ease-of-use of an aberration corrected microscope.

In 1936 Scherzer showed that the fundamental lens aberrations of round lenses are positive definite, in absence of time-varying fields and/or space charge. Negative lens aberrations, required for the correction of Cc and Cs, can only be obtained using non-round lenses, e.g. quadrupoles and octupoles (Scherzer, 1947).

Type
Low Voltage Scanning Electron Microscopy and X-Ray Microanalysis
Information
Microscopy and Microanalysis , Volume 6 , Issue S2: Proceedings: Microscopy & Microanalysis 2000, Microscopy Society of America 58th Annual Meeting, Microbeam Analysis Society 34th Annual Meeting, Microscopical Society of Canada/Societe de Microscopie de Canada 27th Annual Meeting, Philadelphia, Pennsylvania August 13-17, 2000 , August 2000 , pp. 746 - 747
Copyright
Copyright © Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

References:

1.Scherzer, O., Z. Phys. 101 (1936) 593–603CrossRefGoogle Scholar
2.Scherzer, O., Optik 2 (1947) 114–133Google Scholar
3.Archard, G. D., Proc. Royal Soc. London B68 (1955) 817–829Google Scholar
4.Rose, H., Optik 84 (1990) 91–107Google Scholar
5.Zach, J. and Haider, M., Nucl. Instrum. and Methods A363 (1995) 316–325CrossRefGoogle Scholar
6.Mentink, S.A.M., Steffen, T., Tiemeijer, P.C and Krijn, M.P.C.M., Inst. Phys. Conf. Ser. No 161 (1999) 83–86Google Scholar
7. This research was supported by the Ministry of Economic Affairs of the Dutch national government under the metrology platform of MEDEA Project No. T618.Google Scholar