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In-Situ UHV TEM Investigations of the Initial Stages of Cu(001) Oxidation

Published online by Cambridge University Press:  02 July 2020

J. C. Yang ,
M. Yeadon ,
B. Kolasa  and
J. M. Gibson
J. C. Yang
Affiliation:
, University of Illinois at Urbana-Champaign, Urbana, IL, 61801
M. Yeadon
Affiliation:
, University of Illinois at Urbana-Champaign, Urbana, IL, 61801
B. Kolasa
Affiliation:
, University of Illinois at Urbana-Champaign, Urbana, IL, 61801
J. M. Gibson
Affiliation:
, University of Illinois at Urbana-Champaign, Urbana, IL, 61801
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Extract

We studied the beginning oxidation stage of a model metal system by in-situ transmission electron microscopy (TEM) in order to gain insights into the initial kinetics of oxidation. In-situ TEM experiments can distinguish between nucleation and growth since individual oxide islands are imaged. We chose to investigate Cu, since it is a simple face-centered cubic metal. Also, Cu is a highly promising metal interconnect material because of its low resistivity and good electromigration properties as compared to Al.

Single crystal -1000Å 99.999% purity copper films were grown on irradiated NaCl in an UHV e-beam evaporator system. The free-standing copper film was placed on a specially designed holder, which permits resistive heating of the sample. The microscope used for this experiment is a modified ultra-high vacuum, with base pressure of 10−9 torr, JEOL200CX, operated at l00kV. To remove the native oxide formed during exposure in air, the Cu film was annealed at ∼350°C

Type
In Situ Studies in Microscopy
Information
Microscopy and Microanalysis , Volume 3 , Issue S2: Proceedings: Microscopy & Microanalysis '97, Microscopy Society of America 55th Annual Meeting, Microbeam Analysis Society 31st Annual Meeting, Histochemical Society 48th Annual Meeting, Cleveland, Ohio, August 10-14, 1997 , August 1997 , pp. 583 - 584
Copyright
Copyright © Microscopy Society of America 1997

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References

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