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Intermediate Voltage Aem's: Have They Fulfilled Their Potentials?

Published online by Cambridge University Press:  02 July 2020

Nestor J. Zaluzec
Nestor J. Zaluzec*
Affiliation:
Materials Science Division, Argonne National Laboratory, Argonne, IL60439, USA
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Extract

For the last few years analytical developments in intermediate voltage AEM's have remained relatively quiescent. We have instead seen a number of improvements in the basic microscope mainly along the lines of microprocessor controls, automation, and of course improvements in image resolution and electron sources. Since the spectroscopic technologies (XEDS, EELS) have seemed to reach a mid-term plateau it is appropriate to consider whether or not we have achieved the expectations in these methodologies that we predicted nearly a decade ago.

In XEDS, there are three topics to consider: signal, sensitivity and quantification. In AEM's employing conventional electron sources we expected that as a function of accelerating voltage (E0) we should realize a continuous increase in intensity even though the ionization cross-section decreases with kV, and this has been realized (figure 1). It occurs simply due to the fact that the increase in probe current with E0 is more rapid than the more slowly decreasing ionization cross-section.

Type
Analytical Electron Microscopy
Information
Microscopy and Microanalysis , Volume 3 , Issue S2: Proceedings: Microscopy & Microanalysis '97, Microscopy Society of America 55th Annual Meeting, Microbeam Analysis Society 31st Annual Meeting, Histochemical Society 48th Annual Meeting, Cleveland, Ohio, August 10-14, 1997 , August 1997 , pp. 963 - 964
Copyright
Copyright © Microscopy Society of America 1997

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References

1.)Zaluzec, N.J., Introduction to Analytical Electron Microscopy, Plenum Press, (1979), Chptr. 4Google Scholar
2.)Zaluzec, N.J.et al, “Reactive Gas Plasma ..” Microscopy & Microanalysis -97 these proceedings.Google Scholar
3.)Bradley, C.R. - Proc. of 46th EMSA Meeting, 1986 pgs 644–646Google Scholar
4.)This work was supported by US. DoE under BES-MS W-31-109-Eng-38 at ANL.Google Scholar