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Microcharacterization of Defects Induced in Fused Silica by High Power 3ω UV (355nm) Laser Pulses

Published online by Cambridge University Press:  02 July 2020

Marion A. Stevens-Kalceff
Affiliation:
Department of Applied Physicsx, University of Technology, Sydney, PO Box 123 , Broadway , NSW 2007 , AustraliaMarion.Stevens-Kalceff@uts.edu.au
Joe Wong
Affiliation:
Lawrence Livermore National Laboratory, University of California, PO Box 808, Livermore, CA, 94551, USA
Andre Stesmans
Affiliation:
Laboratory of Semiconductor Physics, University of Leuven, Celestijnenlaan, 200 D 3001, Leuven, Belgium.
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Abstract

There are many technical challenges to be overcome before controlled fusion reactions can be achieved. The National Ignition Facility (NIF) at Lawrence Livermore National Laboratory is being developed to initiate fusion reactions using the world's most powerful laser. Essential components of the Facility are the ultra pure silica (SiO2) lenses that focus the powerful laser beams on to the target. Irradiation with a high power laser has been observed to damage the silica lenses, resulting in the formation of defects. The ensuing degradation of the lens performance necessitates its replacement. It is therefore critical to characterize the induced defects and understand the laser damage initiation and evolution, so that damage mitigation strategies can be developed.

Cathodoluminescence (CL) microscopy and spectroscopy enables high spatial resolution and high sensitivity detection of defects in poorly conducting materials. It is therefore an ideal microanalytical technique with which to study laser irradiation-induced defects.

Type
Microscopy in the Real World: Semiconductors and Materials
Copyright
Copyright © Microscopy Society of America 2001

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