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A New Methodology to Analyze Instabilities in SEM Imaging

Published online by Cambridge University Press:  20 October 2014

Catalina Mansilla ,
Václav Ocelík  and
Jeff T. M. De Hosson
Catalina Mansilla*
Affiliation:
Department of Applied Physics, Materials innovation institute M2i, University of Groningen, Nijenborgh 4, Groningen, 9474 AG, The Netherlands
Václav Ocelík
Affiliation:
Department of Applied Physics, Materials innovation institute M2i, University of Groningen, Nijenborgh 4, Groningen, 9474 AG, The Netherlands
Jeff T. M. De Hosson
Affiliation:
Department of Applied Physics, Materials innovation institute M2i, University of Groningen, Nijenborgh 4, Groningen, 9474 AG, The Netherlands
*
*Corresponding author. c.mansilla.sanchez@gmail.com; v.ocelik@rug.nl; j.t.m.de.hosson@rug.nl
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Abstract

This paper presents a statistical method to analyze instabilities that can be introduced during imaging in scanning electron microscopy (SEM). The method is based on the correlation of digital images and it can be used at different length scales. It consists of the evaluation of three different approaches with four parameters in total. The methodology is exemplified with a specific case of internal stress measurements where ion milling and SEM imaging are combined with digital image correlation. It is concluded that before these measurements it is important to test the SEM column to ensure the minimization and randomization of the imaging instabilities. The method has been applied onto three different field emission gun SEMs (Philips XL30, Tescan Lyra, FEI Helios 650) that represent three successive generations of SEMs. Important to note that the imaging instability can be quantified and its source can be identified.

Keywords

scanning electron microscopydigital image correlationself-correlation imageresidual stressfocused ion beam
Type
Technology and Software Development
Information
Microscopy and Microanalysis , Volume 20 , Issue 6 , December 2014 , pp. 1625 - 1637
Copyright
© Microscopy Society of America 2014 

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