Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-26T08:31:57.813Z Has data issue: false hasContentIssue false
  • English
  • Français

Physical and electrical characterization of the interface between atomic-layer-deposited Al2O3 on GaAs substrates for CMOS applications

Published online by Cambridge University Press:  03 August 2008

DI Garcia-Gutierrez ,
V Kaushik ,
D Shahrjerdi  and
S Banerjee
DI Garcia-Gutierrez
Affiliation:
ATDF
V Kaushik
Affiliation:
ATDF
D Shahrjerdi
Affiliation:
University of Texas, Austin
S Banerjee
Affiliation:
University of Texas, Austin
Get access

Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

Type
Research Article
Information
Microscopy and Microanalysis , Volume 14 , Supplement S2 , August 2008 , pp. 446 - 447
Copyright
© 2008 Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)