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Quantitative X-Rays Microanalysis of Rough Surfaces

Published online by Cambridge University Press:  02 July 2020

Raynald Gauvin  and
Eric Lifshin
Raynald Gauvin
Affiliation:
Département de génie mécanique, Université de Sherbrooke, Sherbrooke, Québec, CanadaJ1K2R1.
Eric Lifshin
Affiliation:
Albany Institute for Materials, University at Albany, CESTM, 251 Fuller Road, Albany, NY, 12301.
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Abstract

The classical schemes to convert the x-ray intensity into concentration, using the ZAF or the φ(ρ z ) methods, are valid for specimens having homogeneous composition and flat surfaces. Quantitative schemes have also been developed for x-ray microanalysis of multi-layered specimens. More recently, a quantitative method has been proposed for the microanalysis of spherical inclusions embedded in a matrix.

For the case of specimens having a non-planar surface, a quantitative method based on the peak to background ratio, using photons of the same energy, has been proposed. in order to test this correction method, a Monte Carlo program has been developed in order to compute the complete x-ray spectrum, characteristic lines plus bremstrallung, emitted from materials having rough surfaces. Figure [1] shows the geometry of the rough surfaces simulated. The parameters of these surfaces are the summit semi-angle, θ, and the height of the roughness, h.

Type
Quantitative X-Ray Microanalysis in the Microprobe, in the SEM and in The ESEM:Theory and Practice (Organized by R. Gauvin and E. Lifshin)
Information
Microscopy and Microanalysis , Volume 7 , Issue S2: Proceedings: Microscopy & Microanalysis 2001, Microscopy Society of America 59th Annual Meeting, Microbeam Analysis Society 35th Annual Meeting, Long Beach, California August 5-9, 2001 , August 2001 , pp. 692 - 693
Copyright
Copyright © Microscopy Society of America 2001

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References

1.Goldstein, J. I., Newbury, D. E., Echlin, P., Joy, D. C., Romig, A.D., Lyman, C. E., Fiori, C. & Lifshin, E. (1992), “Scanning Electron Microscopy and Microanalysis”, Plenum Press, New York.CrossRefGoogle Scholar
2.Kyser, D. F. & Murata, K. (1974), “Quantitative Electron Microprobe Analysis of Thin Films on Substrate”, IBM Journal of Res. and Development, 18, pp. 352–363CrossRefGoogle Scholar
3.Gauvin, R., Hovington, P. & Drouin, D. (1995), “Quantification of Spherical Inclusions in the Scanning Electron Microscope Using Monte Carlo Simulations”, Scanning, Vol. 17, pp. 202–219.CrossRefGoogle Scholar
4.Gauvin, R. & Lifshin, E. (2000), “On the Peak to Background Ratio of X-Rays emitted from Rough Surfaces”, Microscopy & Microanalysis, Vol. 6, Supp. 2, pp. 920–921.CrossRefGoogle Scholar