Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-24T00:41:35.796Z Has data issue: false hasContentIssue false
  • English
  • Français

Reduce the electron damage in atomic resolved SEM observation using aberration corrected electron microscope.

Published online by Cambridge University Press:  23 November 2012

M. Konno ,
T. Sato ,
H. Inada ,
K. Nakamura  and
Y. Zhu
M. Konno
Affiliation:
Global Application Center, Hitachi High-Technologies Corporation, Hitachinaka, Ibaraki, Japan
T. Sato
Affiliation:
Global Application Center, Hitachi High-Technologies Corporation, Hitachinaka, Ibaraki, Japan
H. Inada
Affiliation:
Advanced Microscope System Design 2nd Department, Hitachi High-Technologies Corporation, Hitachinaka, Ibaraki, Japan
K. Nakamura
Affiliation:
Advanced Microscope System Design 2nd Department, Hitachi High-Technologies Corporation, Hitachinaka, Ibaraki, Japan
Y. Zhu
Affiliation:
Brookhaven National Laboratory, Upton, NY
Get access

Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 18 , Issue S2: Proceedings of Microscopy & Microanalysis 2012 , July 2012 , pp. 374 - 375
Copyright
Copyright © Microscopy Society of America 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)