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A Routine to Determine the Shift of Kikuchi Bands in EBSD to Sub-pixel Resolution

Published online by Cambridge University Press:  02 July 2020

Xiaodong Tao  and
Alwyn Eades
Xiaodong Tao
Affiliation:
Department of Material Science and Engineering, Lehigh University, Bethlehem, PA18015
Alwyn Eades
Affiliation:
Department of Material Science and Engineering, Lehigh University, Bethlehem, PA18015
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Abstract

The long-term aim of our research is to detect and image dislocations in the SEM with EBSD. We will apply it first to the characterization of threading dislocations in Si/Si-Ge structures. As an initial step, we set out to detect the shift of the Kikuchi bands in EBSD patterns to sub-pixel precision.

In the standard analysis of EBSD patterns, to find the positions of Kikuchi bands, it is usual to use the Hough transform. This transform displays the intensity along all lines in the EBSD pattern, as a function of the position and the angle of the line. Thus linear features in the pattern (Figure 1) appears as peaks in the transform (Figure 2a). in normal EBSD analysis, the aim is to determine the orientation of the grain to a precision of perhaps a degree or two. Therefore, many simplifications are made in the software with the aim of gaining speed.

Type
Diffraction Techniques in TEM and SEM
Information
Microscopy and Microanalysis , Volume 7 , Issue S2: Proceedings: Microscopy & Microanalysis 2001, Microscopy Society of America 59th Annual Meeting, Microbeam Analysis Society 35th Annual Meeting, Long Beach, California August 5-9, 2001 , August 2001 , pp. 366 - 367
Copyright
Copyright © Microscopy Society of America 2001

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References

1.Lassen, N.C.Krieger, Jesson, D J and Conradson, K., Scanning Microscopy, 6 (1992) 115–121Google Scholar
2. OIM™ Data Collection Manual. TSL CompanyGoogle Scholar
3. We are grateful to TSL for allowing us to use their source code.Google Scholar
4. Support from DOE, under grant DE-FG02-00ER45819, is gratefully acknowledgedGoogle Scholar