Atomic Structure and Properties of Charged Domain Walls in BiFeO3 Films

L. Li; P. Gao; C. Nelson; Y. Zhang; S.-J. Kim; A. Melville; C. Adamo; D. Schlom; X. Pan

doi:10.1017/S143192761301026X

Atomic Structure and Properties of Charged Domain Walls in BiFeO3 Films

Published online by Cambridge University Press: 09 October 2013

L. Li ,

P. Gao ,

C. Nelson ,

Y. Zhang ,

S.-J. Kim ,

A. Melville ,

C. Adamo ,

D. Schlom and

X. Pan

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L. Li: Affiliation:
P. Gao: Affiliation:
C. Nelson: Affiliation:
Y. Zhang: Affiliation:
S.-J. Kim: Affiliation:
A. Melville: Affiliation:
C. Adamo: Affiliation:
D. Schlom: Affiliation:
X. Pan: Affiliation:

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Abstract

Abstract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2013 in Indianapolis, Indiana, USA, August 4 – August 8, 2013.

Type: Abstract
Information: Microscopy and Microanalysis , Volume 19 , Issue S2: Proceedings of Microscopy & Microanalysis 2013 , August 2013 , pp. 1654 - 1655

DOI: https://doi.org/10.1017/S143192761301026X [Opens in a new window]

Article contents

Atomic Structure and Properties of Charged Domain Walls in BiFeO3 Films

Abstract

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