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Characterization of VLSI Processing Defects Using STEM-EELS Tomography

Published online by Cambridge University Press:  25 July 2016

Frieder H. Baumann ,
John Miller ,
Bryan Rhoads ,
Anne Friedman  and
Bianzhu Fu
Frieder H. Baumann
Affiliation:
Globalfoundries, 2070 Route 52, Hopewell Junction, NY12533
John Miller
Affiliation:
Globalfoundries, 2070 Route 52, Hopewell Junction, NY12533
Bryan Rhoads
Affiliation:
Globalfoundries, 2070 Route 52, Hopewell Junction, NY12533
Anne Friedman
Affiliation:
Globalfoundries, 2070 Route 52, Hopewell Junction, NY12533
Bianzhu Fu
Affiliation:
Globalfoundries, 400 Stone Break Rd Extension, Malta, NY12020, USA

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 280 - 281
Copyright
© Microscopy Society of America 2016 

References

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[3] Saifullah, M. S. M., et al, Electron Microscopy 96 vol 2 , (Committee of European Societies of Microscopy, Brussels) p. 123–124, 1998.Google Scholar