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Electronic Structure Modification of Boron and Nitrogen Ion-Implanted Graphene Fingerprinted by STEM-EELS

Published online by Cambridge University Press:  27 August 2014

D.M. Kepaptsoglou ,
C.R. Seabourne ,
T. Hardcastle ,
R. Nicholls ,
W. Pierce ,
R. Zan ,
U. Bangert ,
A.J. Scott  and
Q.M. Ramasse
D.M. Kepaptsoglou
Affiliation:
SuperSTEM Laboratory, STFC Daresbury Campus, United Kingdom
C.R. Seabourne
Affiliation:
Institute for Materials Research, SPEME, University of Leeds, Leeds, United Kingdom
T. Hardcastle
Affiliation:
Institute for Materials Research, SPEME, University of Leeds, Leeds, United Kingdom
R. Nicholls
Affiliation:
Department of Materials, University of Oxford, Oxford, United Kingdom
W. Pierce
Affiliation:
School of Materials, University of Manchester, Manchester, M13 9PL, United Kingdom
R. Zan
Affiliation:
School of Materials, University of Manchester, Manchester, M13 9PL, United Kingdom
U. Bangert
Affiliation:
School of Materials, University of Manchester, Manchester, M13 9PL, United Kingdom Department of Physics and Energy, University of Limerick, Limerick, Ireland
A.J. Scott
Affiliation:
Institute for Materials Research, SPEME, University of Leeds, Leeds, United Kingdom
Q.M. Ramasse
Affiliation:
SuperSTEM Laboratory, STFC Daresbury Campus, United Kingdom

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 20 , Supplement S3: Proceedings of Microscopy & Microanalysis 2014 , August 2014 , pp. 1734 - 1735
Copyright
Copyright © Microscopy Society of America 2014 

References

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