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Is It Feasible To Routinely Check The Dopant Profiling Via Off-Axis Electron Holography For An IC Failure Analysis Laboratory?

Published online by Cambridge University Press:  21 July 2003

K.W. Lee ,
H.J. Park ,
Y.C. Wang ,
B.K. Park ,
Sean Da ,
Y.N. Kim ,
J.S. Kim ,
E. Van Cappellen  and
S.M. Chon
K.W. Lee
Affiliation:
Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711
H.J. Park
Affiliation:
Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711
Y.C. Wang
Affiliation:
FEI Company, Hillsboro, OR 97124
B.K. Park
Affiliation:
Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711
Sean Da
Affiliation:
FEI Company, Hillsboro, OR 97124
Y.N. Kim
Affiliation:
Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711
J.S. Kim
Affiliation:
Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711
E. Van Cappellen
Affiliation:
FEI Company, Hillsboro, OR 97124
S.M. Chon
Affiliation:
Samsung Electronics Co, Hwasung-City, Gyeonggi-Do, Korea 449-711

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 9 , Issue S02 , August 2003 , pp. 774 - 775
Copyright
Copyright © Microscopy Society of America 2003