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Microstructural characterization of copper films produced by electrodeposition

Published online by Cambridge University Press:  10 September 2015

R. F. Santos  and
F. Viana
R. F. Santos*
Affiliation:
CEMUC, Department of Metallurgy and Materials Engineering, University of Porto, R. Dr. Roberto Frias, 4200-465 Porto, Portugal
F. Viana
Affiliation:
CEMUC, Department of Metallurgy and Materials Engineering, University of Porto, R. Dr. Roberto Frias, 4200-465 Porto, Portugal
*
Email: ruben.santos@fe.up.pt

Abstract

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Type
Material Sciences
Information
Microscopy and Microanalysis , Volume 21 , Supplement S6: Introduction to the SPMicros Special Issue from the XLVII Annual Congress , August 2015 , pp. 98 - 99
Copyright
Copyright © Microscopy Society of America 2015 

References

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[3]Guan-tai, Lui, et al, Journal of Physics D: Applied Physics 42, 215410, 2009.Google Scholar
[4]Zhang, X. & Misra, A., Scripta Materialia 66, 860–865, 2012.CrossRefGoogle Scholar