Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-11-26T06:50:30.065Z Has data issue: false hasContentIssue false

Optimization of High Current Xenon Plasma Ion Beams for Applications in Semiconductor Failure Analysis and Development

Published online by Cambridge University Press:  27 August 2014

Srinivas Subramaniam
Affiliation:
Intel Corporation, Hillsboro, USA
Kevin Johnson
Affiliation:
Intel Corporation, Hillsboro, USA

Abstract

Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Copyright
Copyright © Microscopy Society of America 2014 

References

[1] Richard, Young, et al, Microsc. Microanal. 17 (Suppl), (2011) 652. [2] Dean Malta et al., IEEE ECTC Proceedings, (2011) 1815.Google Scholar
[3] Giannuzzi, Lucille A.and Smith, Noel S. Microsc. Microanal. 17 (Suppl), (2011) 646.Google Scholar
[4] Volkert, C.A.and Minor, A. M. M.R.S. Bulletin, 32 (2007) 389.Google Scholar