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Staining Block Copolymers using Sequential Infiltration Synthesis for High Contrast Imaging and STEM tomography

Published online by Cambridge University Press:  23 September 2015

T. Segal-Peretz
Affiliation:
Institute for Molecular Engineering, University of Chicago, Chicago, USA Materials Science Division, Argonne National Laboratory, Argonne, USA
J. Winterstein
Affiliation:
Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, USA
M. Biswas
Affiliation:
Energy Systems Division, Argonne National Laboratory, Argonne, USA
J.A. Liddle
Affiliation:
Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, USA
Jeffrey W. Elam
Affiliation:
Energy Systems Division, Argonne National Laboratory, Argonne, USA
N. J. Zaluzec
Affiliation:
Electron Microscopy Center, NST Division, Argonne National Laboratory, Argonne, USA
P.F. Nealey
Affiliation:
Institute for Molecular Engineering, University of Chicago, Chicago, USA Materials Science Division, Argonne National Laboratory, Argonne, USA

Abstract

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Type
Abstract
Copyright
Copyright © Microscopy Society of America 2015 

References

[1] Staniewicz, L., et al., J. Phys.: Conference Series (2010), 012077.CrossRefGoogle Scholar
[2] Peng, Q., Tsemg, Y. C. & Elam, J. W, Adv. Mater 22 (2010) 5129.CrossRefGoogle Scholar
[3] This work was supported by U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences, under Contract No. DE-AC02-06CH11357.Google Scholar