TEM and PEELS Study of Mn Diffusion in an MRAM Structure

S. X. Wang; M. M. Kowalewski

doi:10.1017/S1431927603442487

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TEM and PEELS Study of Mn Diffusion in an MRAM Structure

Published online by Cambridge University Press: 22 July 2003

S. X. Wang and

M. M. Kowalewski

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S. X. Wang: Affiliation:
Micron Technology, Inc., Boise, ID 83707, US
M. M. Kowalewski: Affiliation:
Micron Technology, Inc., Boise, ID 83707, US

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Type: Abstract
Information: Microscopy and Microanalysis , Volume 9 , Issue S02 , August 2003 , pp. 496 - 497

DOI: https://doi.org/10.1017/S1431927603442487 [Opens in a new window]
Copyright: Copyright © Microscopy Society of America 2003

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TEM and PEELS Study of Mn Diffusion in an MRAM Structure

Volume 9, Issue S02
S. X. Wang ^(a1) and M. M. Kowalewski ^(a1)
DOI: https://doi.org/10.1017/S1431927603442487

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TEM and PEELS Study of Mn Diffusion in an MRAM Structure

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