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TEM Sample Preparation Using a New Nanofabrication Technique Combining Electron-Beam-Induced Deposition and Low-Energy Ion Milling

Published online by Cambridge University Press:  11 October 2006

Kazutaka Mitsuishi
Affiliation:
National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
Masayuki Shimojo
Affiliation:
Saitama Institute of Technology, Saitama 369-0293, Japan
Miyoko Tanaka
Affiliation:
National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
Masaki Takeguchi
Affiliation:
National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
Minghui Song
Affiliation:
National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
Kazuo Furuya
Affiliation:
National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan
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Abstract

A new TEM sample preparation technique using electron-beam-induced deposition combined with low-energy ion milling was used to fabricate for two different shapes of sample, conical and plate. High-quality HREM images can be obtained from samples prepared by this technique. A desired sample position can be obtained with high accuracy, and the total sample preparation time can be much less than conventional techniques. Because the gas deposition system used can easily be integrated in a conventional SEM, the method can be performed in any laboratory equipped with a SEM and an ion milling machine.

Type
Research Article
Copyright
© 2006 Microscopy Society of America

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References

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