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TEM Study of Oxygen Precipitation in Si Wafers with Backside Layers

Published online by Cambridge University Press:  01 August 2005

R Yu ,
X F Zhang ,
Q Wang ,
M Daggubati  and
H Paravi
R Yu
Affiliation:
Lawrence Berkeley National Laboratory, Berkeley, California
X F Zhang
Affiliation:
Lawrence Berkeley National Laboratory, Berkeley, California
Q Wang
Affiliation:
Fairchild Semiconductor Corporation, West Jordan, Utah
M Daggubati
Affiliation:
Fairchild Semiconductor Corporation, West Jordan, Utah
H Paravi
Affiliation:
Fairchild Semiconductor Corporation, West Jordan, Utah

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

Type
Research Article
Information
Microscopy and Microanalysis , Volume 11 , Issue S02 , August 2005 , pp. 2070 - 2071
Copyright
© 2005 Microscopy Society of America