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Two New Evactron® Plasma Cleaners for Small Chambers and UHV Systems

Published online by Cambridge University Press:  30 July 2021

Ronald Vane
Affiliation:
XEI Scientific, Redwood City, California, United States
George Safar
Affiliation:
XEI Scientific, Redwood City, California, United States
Ewa Kosmowska
Affiliation:
XEI Scientific, Redwood City, California, United States
Barbara Armbruster
Affiliation:
XEI Scientific, Redwood City, California, United States
Michael Cable
Affiliation:
XEI Scientific, Redwood City, California, United States

Abstract

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Type
Vendor Symposium
Copyright
Copyright © The Author(s), 2021. Published by Cambridge University Press on behalf of the Microscopy Society of America

References

Vane, R., et al. , Microsc. Microanal. 25 (S2) (2019), 550.Google Scholar
Kosmowska, E., et al. , Microsc. Microanal. 23 (S1) (2017), 74.CrossRefGoogle Scholar
Vane, R., Kosmowska, E. and Cable, M., Microsc. Microanal. 26 (S3) https://doi.org/10.1017/S1431927620022497 (2020).CrossRefGoogle Scholar
US patent US 10,468,236 B2, Ronald Vane et al. Nov. 5, 2019.Google Scholar
Armbruster, B., et al. , Microsc. Microanal. 26 (S3) https://doi.org/10.1017/S1431927620022485 (2020).CrossRefGoogle Scholar
Tanaka, Y., Yamashita, T. and Nagoshi, M., Microscopy 66 (2) (2017), 68.Google Scholar
Vane, R. and Cable, M., Microsc. Microanal. 24 (S1) (2018), 1152.Google Scholar