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Understanding High Contact Resistance in M0S2 FETs using STEM-EELS

Published online by Cambridge University Press:  01 August 2018

Ryan J. Wu  and
K. Andre Mkhoyan
Ryan J. Wu
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, MN
K. Andre Mkhoyan
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, MN

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 24 , Supplement S1: Proceedings of Microscopy & Microanalysis 2018 , August 2018 , pp. 1558 - 1559
Copyright
© Microscopy Society of America 2018 

References

[1] Chhowalla, M., et al, Nature Chemistry 5 2013) p. 263.Google Scholar
[2] Chhowalla, M., Jena, D. Zhang, H. Nature Reviews: Materials 1 2016) p. 16052.Google Scholar
[3] Allain, A., Kang, J., Banerjee, K. Kis, A. Nature Materials 12 2015) p. 1195.Google Scholar
[4] This project is financially supported by C-SPIN, one of six centers of STARnet, a Semiconductor Research Corporation program, sponsored by MARCO and DARPA and by the MRSEC program of the NSF under award DMR-1420013.Google Scholar